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<xml><bibliography><APA>Jariyaporn RUKKUN และ Kamon AIEMPANAKIT;Pimchanok REAKAUKOT;Witthawat WONGPISAN;Kirati WAREE;Montri AIEMPANAKIT. (2021) Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering. &lt;i&gt;Journal of Metals, Materials and Minerals&lt;/i&gt;, &lt;i&gt;31&lt;/i&gt;(2), 118-122.</APA><Chicago>Jariyaporn RUKKUN และ Kamon AIEMPANAKIT;Pimchanok REAKAUKOT;Witthawat WONGPISAN;Kirati WAREE;Montri AIEMPANAKIT. "Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering". Journal of Metals, Materials and Minerals  31 (2021):118-122.</Chicago><MLA>Jariyaporn RUKKUN และ Kamon AIEMPANAKIT;Pimchanok REAKAUKOT;Witthawat WONGPISAN;Kirati WAREE;Montri AIEMPANAKIT. Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering. Metallurgy and Materials Science Research Institute Chulalongkorn University:ม.ป.ท. 2021.</MLA></bibliography></xml>
